TAL-XY60 XY-Axis Pitch and Yaw Stage

Description

Product Description

Inclination and tilt adjustment platform with ±4° angular adjustment per axis;

• Available regulator options: TAL-XY60 micrometer-type (0.5 mm per turn, resolution 10 μm); TAL-XY60 differential-scale type (coarse adjustment: 0.5 mm per turn; fine adjustment range: 350 μm or 25 μm per turn, resolution 0.5 μm).
• Countertop with M4 and M6 screw hole arrays;
• Compatible with the Nano three-axis flexible displacement stage system, providing two additional degrees of freedom;

The TAL-XY60 series angle platforms offer dual-axis adjustment for pitch and yaw, with each axis adjustable within ±4°, and customizable drive options.

Technical Notes

1) Dual precision drive option: TAL-XY60 micrometer type (0.5mm/turn, resolution 10 μ m), suitable for universal angle adjustment and quick positioning. TAL-XY60P differential ruler type (25 μ m/circle, resolution 0.5 μ m), suitable for high-precision alignment, low light or small angle sensitive applications.

(2) Beam pointing control: Combined with Nano three-axis displacement table, a five axis (X, Y, Z, Pitch, Yaw) precision positioning system is constructed, suitable for semiconductor detection, confocal microscopy, etc.

(3) Integrate OPS adapter board into existing displacement table to quickly increase angle adjustment function and customize the construction of multi axis displacement system; Cooperate with the connecting rod component to install on the optical platform, which can flexibly adjust the height and direction of the optical path;

(4) Install optical components or pressure arm fixtures directly through the M4/M6 screw holes on the countertop;

(5) Dual precision drive option, please note: do not exceed the mechanical limit of ± 4 ° during adjustment to avoid damaging the internal structure.

Assembly

Application Examples

Engineering Drawings

TAL-XY60 Engineering Drawing

TAL-XY60P Engineering Drawing